姓名:王子恒
性别:男
职称:青年研究员,硕士生导师
最高学位:博士
个人简介:
2020年5月本科毕业于电子科技大学,2021年5月硕士毕业于美国Rutgers大学,2025年12月博士毕业于上海交通大学集成电路学院,2026年1月加入东华大学机械工程学院,担任青年研究员。
研究方向:
新型半导体材料、器件与工艺,
单片三维集成技术
微纳器件加工与测试
代表性论文:
Z. Wang, J. Zhao, K. Jiang, et al., “In2O3–ZnO Superlattice Transistors by Atomic Layer Deposition with High Field-Effect Mobility,” IEEE Electron Device Lett., vol. 46, no. 3, pp. 412-415, 2025.
Z. Wang, L. Zheng, Z. Lin, et al., “CMOS Logic and Capacitorless DRAM by Stacked Oxide Semiconductor and Poly-Si Transistors for Monolithic 3-D Integration,” IEEE Trans. Electron Devices, vol. 71, no. 8, pp. 4664-4669, 2024.
W. Tang, Z. Lin†, Z. Wang†, et al., “Monolithic 3D Integration of Vertically Stacked CMOS Devices and Circuits with High-Mobility Atomic-Layer-Deposited In2O3 n-FET and Polycrystalline Si p-FET: Achieving Large Noise Margin and High Voltage Gain of 134 V/V,” in 2022 IEEE International Electron Devices Meeting (IEDM), 2022, pp. 483-486.
Z. Wang, Z. Lin, M. Si, and P. D. Ye, “Characterization of Interface and Bulk Traps in Ultrathin Atomic Layer-Deposited Oxide Semiconductor MOS Capacitors With HfO2/In2O3 Gate Stack by C-V and Conductance Method,” Front. Mater., vol. 7, pp. 1-7, 2022.
联系方式:
地址:上海市松江区人民北路2999号4号学院楼6029室 邮编:201620
邮箱:wangziheng0723@dhu.edu.cn
电话:15520775823
欢迎对微纳器件制备与表征、半导体材料与器件等有兴趣的相关专业同学联系报考!
